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Silicon device manufacturing, at both the micro and nanoscales, is largely performed using plasma etching techniques such as Reactive Ion Etching. Deep Reactive
Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
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Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in
Integrated Silicon-Metal Systems at the Nanoscale
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Integrated Silicon-Metal Systems at the Nanoscale: Applications in Photonics, Quantum Computing, Networking, and Internet is a comprehensive guide to the intera
Fabrication of Silicon Nanowires with Controlled Nano-scale Shapes Using Wet Anisotropic Etching
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Silicon nanowires can enable important applications in energy and healthcare such as biochemical sensors, thermoelectric devices, and ultra-capacitors. In the e
Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
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Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in