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Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects
Language: en
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Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects

Authors: Ting Y. Tsui
Categories: Technology & Engineering
Type: BOOK - Published: 2006 - Publisher:

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Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics
Language: en
Pages: 440

Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics

Authors:
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004
Language: en
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004

Authors: R. J. Carter
Categories: Technology & Engineering
Type: BOOK - Published: 2004-09 - Publisher:

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The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and
Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, 2003
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Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, 2003

Authors: Materials Research Society. Meeting
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Copper Interconnect Technology
Language: en
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Copper Interconnect Technology

Authors: Tapan Gupta
Categories: Technology & Engineering
Type: BOOK - Published: 2010-01-22 - Publisher: Springer Science & Business Media

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Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transist

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