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Language: en
Pages: 445
Pages: 445
Type: BOOK - Published: 1995 - Publisher:
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing,
Language: en
Pages: 467
Pages: 467
Type: BOOK - Published: 1996-12-31 - Publisher: Elsevier
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing,
Language: en
Pages: 343
Pages: 343
Type: BOOK - Published: 2013-10-22 - Publisher: Academic Press
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, elec
Language: en
Pages: 664
Pages: 664
Type: BOOK - Published: 2011-06-28 - Publisher: Springer Science & Business Media
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.
Language: en
Pages: 268
Pages: 268
Type: BOOK - Published: 1999-10-14 - Publisher: Academic Press
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate
