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Advances in CMP Polishing Technologies
Language: en
Pages: 330
Authors: Toshiro Doi
Categories: Science
Type: BOOK - Published: 2011-12-06 - Publisher: William Andrew

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CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing
Advances in Chemical Mechanical Planarization (CMP)
Language: en
Pages: 650
Authors: Babu Suryadevara
Categories: Technology & Engineering
Type: BOOK - Published: 2021-09-10 - Publisher: Woodhead Publishing

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Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, hi
Chemical-Mechanical Planarization of Semiconductor Materials
Language: en
Pages: 444
Authors: M.R. Oliver
Categories: Technology & Engineering
Type: BOOK - Published: 2004-01-26 - Publisher: Springer Science & Business Media

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This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor te
Advances in Abrasive Based Machining and Finishing Processes
Language: en
Pages: 282
Authors: S. Das
Categories: Technology & Engineering
Type: BOOK - Published: 2020-05-10 - Publisher: Springer Nature

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This book presents the advances in abrasive based machining and finishing in broad sense. Specifically, the book covers the novel machining and finishing strate
Chemical Mechanical Planarization of Microelectronic Materials
Language: en
Pages: 337
Authors: Joseph M. Steigerwald
Categories: Science
Type: BOOK - Published: 2008-09-26 - Publisher: John Wiley & Sons

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Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its univ