Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces
Author | : |
Publisher | : |
Total Pages | : 0 |
Release | : 1997 |
ISBN-10 | : OCLC:946109367 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces by :
Download or read book Development and Application of In-Situ, Real Time and Ex-Situ Characterization Techniques to Study the Growth of High Temperature Superconducting (HTSC) Films and Interfaces written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objectives of this program are: (1) To demonstrate Time of Flight Ion Scattering and Recoil (ToF-ISARS) Spectroscopy and Spectroscopic Ellipsometry (SE) for in-situ and real time characterization of HTSC thin films and processes. (2) To study HTSC thin film processes and interface reactions.