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Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition
Language: en
Pages: 278

Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition

Authors: Yi Ma
Categories:
Type: BOOK - Published: 1993 - Publisher:

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Device Quality Remote Plasma-enhanced Chemical Vapor Deposited (RPECVD) Gate Dielectrics for MOS Applications
Language: en
Pages: 282

Device Quality Remote Plasma-enhanced Chemical Vapor Deposited (RPECVD) Gate Dielectrics for MOS Applications

Authors: Christopher Gerald Parker
Categories: Dielectric devices
Type: BOOK - Published: 1998 - Publisher:

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Development of Plasma Enhanced Chemical Vapor Deposition (PECVD) Gate Dielectrics for Thin-film Transistor Applications
Language: en
Pages: 178

Development of Plasma Enhanced Chemical Vapor Deposition (PECVD) Gate Dielectrics for Thin-film Transistor Applications

Authors: Germain L. Fenger
Categories: Thin film transistors
Type: BOOK - Published: 2010 - Publisher:

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"This study investigated a variety of electrically insulating materials for potential use as a gate dielectric in thin-film transistor applications. The materia
Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition
Language: en
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Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition

Authors: Jeremy Alfred Theil
Categories:
Type: BOOK - Published: 1992 - Publisher:

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Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma
Language: en
Pages: 0

Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma

Authors: Jacob Comeaux
Categories: Dielectric films
Type: BOOK - Published: 2022 - Publisher:

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