Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition
| Author | : Jeremy Alfred Theil |
| Publisher | : |
| Total Pages | : 478 |
| Release | : 1992 |
| ISBN-10 | : OCLC:26507213 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition by : Jeremy Alfred Theil
Download or read book Effects of Deposition Parameters on Thin Film Properties of Si-based Electronic Materials Deposited by Remote Plasma-enhanced Chemical Vapor Deposition written by Jeremy Alfred Theil and published by . This book was released on 1992 with total page 478 pages. Available in PDF, EPUB and Kindle. Book excerpt:
