Related Books
Language: en
Pages: 467
Pages: 467
Type: BOOK - Published: 1996-12-31 - Publisher: Elsevier
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing,
Language: en
Pages: 445
Pages: 445
Type: BOOK - Published: 1995 - Publisher:
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing,
Language: en
Pages: 343
Pages: 343
Type: BOOK - Published: 2013-10-22 - Publisher: Academic Press
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, elec
Language: en
Pages: 556
Pages: 556
Type: BOOK - Published: 2013-11-21 - Publisher: Springer Science & Business Media
Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Language: en
Pages: 664
Pages: 664
Type: BOOK - Published: 2011-06-28 - Publisher: Springer Science & Business Media
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.
