Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma
| Author | : Jacob Comeaux |
| Publisher | : |
| Total Pages | : 0 |
| Release | : 2022 |
| ISBN-10 | : OCLC:1356865055 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma by : Jacob Comeaux
Download or read book Low Dielectric Constant SiCOH Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition and Their Etching Characteristics Using Fluorocarbon-based Plasma written by Jacob Comeaux and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
