Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane
| Author | : Zhongping Jin |
| Publisher | : |
| Total Pages | : 274 |
| Release | : 2005 |
| ISBN-10 | : OCLC:65168685 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane by : Zhongping Jin
Download or read book Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane written by Zhongping Jin and published by . This book was released on 2005 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt:
