Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit wil
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist material
As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base dev
The constant demand for increased circuit density and higher resolution patterning calls for simultaneous advancements in materials chemistry. A variety of poss
With recent technological improvements, fabrication of integrated circuit elements on shrinking scales is required to meet the demand for massive storage and fa