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Small Molecule Photoresist Materials for Next Generation Lithography
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Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit wil
Materials and Processes for Next Generation Lithography
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Type: BOOK - Published: 2016-11-08 - Publisher: Elsevier

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist material
Solvent-based Development of Photoresists for Next-generation Lithography
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As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base dev
Advanced Materials for Next-Generation Lithography
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The constant demand for increased circuit density and higher resolution patterning calls for simultaneous advancements in materials chemistry. A variety of poss
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures
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With recent technological improvements, fabrication of integrated circuit elements on shrinking scales is required to meet the demand for massive storage and fa