Study of Plasma Enhanced Chemical Vapor Deposition of Boron-doped Hydrogenated Amorphous Silicon Thin Films and the Application to P-channel Thin Film Transistor
| Author | : Helinda Nominanda |
| Publisher | : |
| Total Pages | : 178 |
| Release | : 2004 |
| ISBN-10 | : OCLC:56697275 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Study of Plasma Enhanced Chemical Vapor Deposition of Boron-doped Hydrogenated Amorphous Silicon Thin Films and the Application to P-channel Thin Film Transistor by : Helinda Nominanda
Download or read book Study of Plasma Enhanced Chemical Vapor Deposition of Boron-doped Hydrogenated Amorphous Silicon Thin Films and the Application to P-channel Thin Film Transistor written by Helinda Nominanda and published by . This book was released on 2004 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:
