Characterization of Silicon Epitaxy Deposited by Plasma-enhanced Chemical Vapor Deposition at Low Temperatures and Very Low Pressures

Characterization of Silicon Epitaxy Deposited by Plasma-enhanced Chemical Vapor Deposition at Low Temperatures and Very Low Pressures
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Total Pages : 374
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ISBN-10 : OCLC:17642078
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Book Synopsis Characterization of Silicon Epitaxy Deposited by Plasma-enhanced Chemical Vapor Deposition at Low Temperatures and Very Low Pressures by : Linda Mason Garverick

Download or read book Characterization of Silicon Epitaxy Deposited by Plasma-enhanced Chemical Vapor Deposition at Low Temperatures and Very Low Pressures written by Linda Mason Garverick and published by . This book was released on 1987 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt:


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This paper reviews the most recent results obtained using a very low pressure, plasma enhanced chemical vapor deposition technique for low temperature (650-800�