Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition

Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition
Author :
Publisher :
Total Pages : 278
Release :
ISBN-10 : OCLC:29901625
ISBN-13 :
Rating : 4/5 ( Downloads)

Book Synopsis Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition by : Yi Ma

Download or read book Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition written by Yi Ma and published by . This book was released on 1993 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:


Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition Related Books

Device Quality Ultra Thin Dielectrics Deposited by Remote Plasma Enhanced Chemical Vapor Deposition
Language: en
Pages: 278
Device Quality Remote Plasma-enhanced Chemical Vapor Deposited (RPECVD) Gate Dielectrics for MOS Applications
Language: en
Pages: 282
Authors: Christopher Gerald Parker
Categories: Dielectric devices
Type: BOOK - Published: 1998 - Publisher:

DOWNLOAD EBOOK

Development of Plasma Enhanced Chemical Vapor Deposition (PECVD) Gate Dielectrics for Thin-film Transistor Applications
Language: en
Pages: 178
Authors: Germain L. Fenger
Categories: Thin film transistors
Type: BOOK - Published: 2010 - Publisher:

DOWNLOAD EBOOK

"This study investigated a variety of electrically insulating materials for potential use as a gate dielectric in thin-film transistor applications. The materia