Directed Self-Assembly of Symmetric Block Copolymer with Density Multiplication for Nanopatterning Applications
Author | : Xuanxuan Chen |
Publisher | : |
Total Pages | : 141 |
Release | : 2017 |
ISBN-10 | : 0355234335 |
ISBN-13 | : 9780355234336 |
Rating | : 4/5 (336 Downloads) |
Download or read book Directed Self-Assembly of Symmetric Block Copolymer with Density Multiplication for Nanopatterning Applications written by Xuanxuan Chen and published by . This book was released on 2017 with total page 141 pages. Available in PDF, EPUB and Kindle. Book excerpt: Block copolymers (BCPs) are a group of fascinating materials that self-assemble into highly uniform nanoscale structures. With precise control of interfacial properties on both interfaces, these nanostructures can be directed to form user-defined periodic patterns. The directed self-assembly (DSA) of BCPs offers a cost-effective solution to complement the conventional lithography with the capability of density multiplication and pattern rectification. This dissertation mainly focuses on the chemoepitaxial DSA of symmetric BCP into line patterns.