Fundamental Studies of Defect Generation in Amorphous Silicon Alloys Grown by Remote Plasma-enhanced Chemical-vapor Deposition (remote PECVD)
| Author | : G. Lucovsky |
| Publisher | : |
| Total Pages | : 44 |
| Release | : 1993 |
| ISBN-10 | : OCLC:36441434 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Fundamental Studies of Defect Generation in Amorphous Silicon Alloys Grown by Remote Plasma-enhanced Chemical-vapor Deposition (remote PECVD) by : G. Lucovsky
Download or read book Fundamental Studies of Defect Generation in Amorphous Silicon Alloys Grown by Remote Plasma-enhanced Chemical-vapor Deposition (remote PECVD) written by G. Lucovsky and published by . This book was released on 1993 with total page 44 pages. Available in PDF, EPUB and Kindle. Book excerpt:
