Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Carbon Alloys

Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Carbon Alloys
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Publisher :
Total Pages : 154
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ISBN-10 : OCLC:36465085
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Book Synopsis Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Carbon Alloys by : Tanja R. Darden

Download or read book Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Hydrogenated Silicon Carbon Alloys written by Tanja R. Darden and published by . This book was released on 1995 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt:


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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX mach