Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films
Author | : Sui-Yuan Lynn |
Publisher | : |
Total Pages | : 212 |
Release | : 1987 |
ISBN-10 | : OCLC:80964880 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films by : Sui-Yuan Lynn
Download or read book Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films written by Sui-Yuan Lynn and published by . This book was released on 1987 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt: