Download or read book Thermal Plasma Processing of Materials. Progress Report, September 1, 1988--January 31, 1992 written by and published by . This book was released on 1992 with total page 33 pages. Available in PDF, EPUB and Kindle. Book excerpt: Emphasis has been on plasma synthesis of fine powders, plasma Chemical Vapor Deposition (CVD), on related diagnostics, and on modeling work. Since plasma synthesis as well as plasma CVD make frequent use of plasma jets, the beginning has been devoted of plasma jets and behavior of particulates injected into such plasma jets. Although most of the construction of the Triple-Torch Plasma Reactor (TTPR) has already been done, modifications have been made in particular modifications required for plasma CVD of diamond. A new reactor designed for Counter-Flow Liquid Injection Plasma Synthesis (CFLIPS) proved to be an excellent tool for synthesis of fine powders as well as for plasma CVD. An attempt was made to model flow and temperature fields in this reactor. Substantial efforts were made to single out those parameters which govern particle size, size distribution, and powder quality in our plasma synthesis experiments. This knowledge is crucial for controlling the process and for meaningful diagnostics and modeling work. Plasma CVD of diamond films using both reactors has been very successful and we have been approached by a number of companies interested in using this technology for coating of tools.